![]() |
|||||||||
| Laser Micro-Material Processing: Laser Structuring, Laser Scribing, Laser-Micro Drilling Laser Processing of ceramic, Silicon Wafer, Solar cells, Thinfilm solar cell Laser for Photovoltaics, Productronic, Electronics Laser Wafer Marking, Wafer Sorting, Wafer Handling, Wafer-Inspection Laser Sources, Scientific Laser Systems: 1064 nm, 693 nm, 532 nm, 355 nm, 266 nm, 213 nm UV-Laser CO2-Laser, Nd:YAG-Laser, Ruby Laser, Vanadat Laser, Dye-Laser for Holography, Spectroscopy, PIV, LIF |
|||||||||
| D-82152 Krailling Justus-von-Liebig-Ring 8 +49(89)899360-0 info@innolas.com (c) InnoLas GmbH 2001-2006 |
|||||||||
![]() |
|||||||||
| calculate route | |||||||||
| Legal | |||||||||
| Deutsche Version | |||||||||
| InnoLas develops and manufactures innovative Laser systems for Industry, Research and Science | |||||||||
Laser Micro-Material Processing for Photovoltaics, |
|||||||||
| Based on processing methods like laser structuring, laser scribing or Laser micro-drilling the Innolas systems optimises manufacturing e.g. in the production of solar cells productronic A material specific choice of laser sources supports the processing of different materials like ceramic, Aluminium-Oxyde Substrate, metal, solar cell, thinfilm-solar cell. |
|||||||||
Laser systems and equipment for the Processing of Wafers |
|||||||||
| InnoLas is a European market leader in developing and manufacturing laser systems for wafer marking as well as machines for wafer sorting and wafer inspection. Best productivity and reliability are characteristic for all InnoLas machines for marking and handling of Silicon wafer und wafer made of other materials. |
|||||||||
Scientific laser systems |
|||||||||
| As a partner of research and science InnoLas develops and commissions laser systems. The product palette includes all types of laser sources: CO2-Laser, Nd:YAG-Laser, ruby laser, Vanadat-Laser, tuneable laser, diode pumped Laser, Dye-Laser, Pico-seconds-systems. Theses laser sources offers typical wave lengths like 1064 nm, 693 nm, 532 nm, 355 nm, 266 nm and UV-laser light. Fields of application are among others: holography, spectroscopy, Particle Image Velocimetry (PIV), Laser induced fluorescence (LIF), OPO-Laser. |
|||||||||